By Noriaki Nakayamada
What's the best way to deal with the menacing heating effects in VSB mask writing? The answer lies in part on leveraging GPU acceleration. Check out this video on what's ahead for multi-beam mask writing.
—Noriaki Nakayamada is group manager at NuFlare Technology. » read more
By Tony Luo
What are the challenges in optical inspection? Let's take a closer look. Click on the video below to find out.
—Tony Luo is the founder of Singapore-based Maglen. » read more
Multibeam's David Lam looks at changes in semiconductor lithography, how CVD and etch improve pitch resolution that is not attainable using optical lithography, and how e-beam direct-write can finish the job.
[youtube vid=2ZCF-o7DXlU] » read more
By Aki Fujimura
The same types of physics-based issues that have haunted lithography for decades have started to impact mask writing as well. The increasingly small and complex mask shapes specified by optical proximity correction (OPC) that are now required for faithful wafer lithography at 28nm-and-below nodes have given rise to an increase in mask hotspots. Mask hotspots occur when the shap... » read more