Delivering On The Promise Of Self-Driving Cars


Self-driving cars have been all the rage in both the trade and popular press in recent years. I prefer the term “autonomous vehicles,” which more broadly captures the possibilities, encompassing not only small passenger vehicles but mass transit and industrial vehicles as well. Depending on who’s talking, we will all be riding in fully autonomous vehicles in five to 25 years. The five-... » read more

What’s In A Node?


In an environment where process nodes are no longer consistently delivering the level of improvements predicted by Moore’s Law, the industry will continue to develop “inter-nodes” as a way to deliver incremental improvements in lieu of “full-nodes.” A shift in market requirements, in part due to the rise of AI and IoT, is increasing emphasis on trailing-nodes. When it comes to leading... » read more

Transistor-Level Performance Evaluation Based On Wafer-Level Process Modeling


Three years ago, I wrote a blog entitled “Linking Virtual Wafer Fabrication Modeling with Device-level TCAD Simulation,” in which I described the seamless connection between the SEMulator3D virtual wafer fabrication software platform and external third-party TCAD software. I’m now happy to report that device-level I-V performance analysis is now a built-in module within the SEMulator3D so... » read more

The Power Of De-Integration


The idea that more functionality can be added into a single chip, or even into a single system, is falling out of vogue. For an increasing number of applications, it's no longer considered the best option for boosting performance or lowering power, and it costs too much. Hooman Moshar, vice president of engineering at Broadcom, said in a keynote speech at Mentor's User2User conference this w... » read more

What’s Missing In EUV?


Extreme ultraviolet (EUV) lithography is expected to move into production at 7nm and/or 5nm, but as previously reported, there are some gaps in the arena. At one time, the power source was the big problem, but that appears to be solved in the near term. Now, a phenomenon called stochastic effects, or random variations, are the biggest challenge for EUV lithography. But at most events, th... » read more

The Challenges Of Process Control On FinFETs And FD-SOI


Across the semiconductor industry, both FD-SOI and finFET transistor technologies are in high volume production, with IC manufacturers looking to extend both technologies to gain additional performance improvements and meet the variety of customer specific technical and economic requirements. In developing the processes needed for the next-generation FD-SOI and finFET technologies, both transis... » read more

How 5G Differs From Previous Network Technologies


The Mobile World Congress in Barcelona, Spain is the wireless industry’s leading annual event, and this year’s edition in late February was buzzing with talk of 5G wireless technology and its evolving uses and technology requirements. First, Gregg Bartlett and Dr. Bami Bastani, Sr. Vice Presidents of GlobalFoundries' CMOS and RF business units, respectively, outlined 5G-related semico... » read more

Global Investment Is Key To The Semiconductor Ecosystem


In response to the European Commission’s (EC) proposed framework for screening foreign direct investments (FDI), SEMI, representing the global electronics manufacturing supply chain, offers three recommendations for consideration by EU policymakers: To support the sophisticated global ecosystem of semiconductor manufacturers, the EU should remain open to global investment. More efforts sho... » read more

Advanced 3D Design Technology Co-Optimization For Manufacturability


By Yu De Chen, Jacky Huang, Dalong Zhao, Jiangjiang (Jimmy) Gu, and Joseph Ervin Yield and cost have always been critical factors for both manufacturers and designers of semiconductor products. It is a continuous challenge to meet targets of both yield and cost, due to new device structures and the increasing complexity of process innovations introduced to achieve improved product performanc... » read more

AI Accelerating Discovery


In early April 2018, the Materials Research Society held their spring meeting and exhibit at the Phoenix, Arizona convention center. With more than 110 symposium presentations, it was difficult to select which sessions to attend. But one forum caught my eye, “AI for Materials Development”. These days AI seems to be everywhere. As we all speculate about the impact of AI on autonomous driv... » read more

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