Manufacturing Bits: Sept. 19


Ion implant lithography At a recent conference, the University of California at Berkeley presented more details about its efforts to develop a multiple patterning method using tilted ion implantation (TII) technology. TII is somewhat similar today’s self-aligned double patterning (SADP) processes in logic and memory. SADP and the follow-on technology, self-aligned quadruple (SAQP), enable... » read more

System Bits: Sept. 19


Novel quantum computing architecture invented University of New South Wales researchers have invented what they say is a radical new architecture for quantum computing, based on ‘flip-flop qubits,’ that promises to make the large-scale manufacture of quantum chips dramatically easier. [caption id="attachment_319384" align="alignnone" width="300"] Artist's impression of flip-flop qubit e... » read more

Power/Performance Bits: Sept. 19


Healing perovskites A team from the University of Cambridge, MIT, University of Oxford, University of Bath, and Delft University of Technology discovered a way to heal defects in perovskite solar cells by exposing them to light and just the right amount of humidity. While perovskites show promise for low-cost, efficient photovoltaics, tiny defects in the crystalline structure, called traps,... » read more

Manufacturing Bits: Sept. 12


Failure analysis for 2.5D/3D chips Imec has developed a new failure analysis method to localize interconnection failures in 2.5D/3D stack die with through-silicon vias (TSVs). This technique is called LICA, which stands for light-induced capacitance alteration. It addresses the reliability issues for 2.5D/3D devices in a non-destructive and cost-effective manner at the wafer level. For s... » read more

Power/Performance Bits: Sept. 12


Water-based li-ion battery Researchers at the University of Maryland and the U.S. Army Research Laboratory developed a lithium-ion battery that uses a water-salt solution as its electrolyte and reaches the 4.0 volt mark desired for household electronics, without the fire and explosive risks associated with some commercially available non-aqueous lithium-ion batteries. The battery provides i... » read more

System Bits: Sept. 12


Neural network cautionary tale As machine learning and neural networks proliferate widely today, there is a need to exercise caution in how they are employed, according to Stanford University researchers Michal Kosinki and Yilun Wang. In a study conducted recently, they have shown that deep neural networks can be used to determine the sexual orientation of a person, and caution that this ma... » read more

Manufacturing Bits: Sept. 5


Laser-magnet metrology The FELIX Laboratory and the High Field Magnet Laboratory (HFML) have recently conducted the first measurements that combine a free electron laser (FEL) with a powerful magnet. The combination enables researchers to explore the electronic properties of materials. It provides a way to perform terahertz (THz) magneto spectroscopy on samples. The FELIX Laboratory at R... » read more

System Bits: Sept. 5


Reducing power consumption of datacenter caches As is commonly understood, most websites store data in databases, and since database queries are relatively slow, most sites also maintain so-called cache servers, which list the results of common queries for faster access, researchers from MIT’s Computer Science and Artificial Intelligence Laboratory (CSAIL) reminded. They noted that a data ce... » read more

Power/Performance Bits: Sept. 5


Energy-harvesting yarn Researchers at the University of Texas at Dallas and Hanyang University in South Korea developed a carbon nanotube yarn that generates electricity when stretched or twisted. Possible applications for the so-called "twistron" yarns include harvesting energy from the motion of ocean waves or from temperature fluctuations. When sewn into a shirt, these yarns served as a sel... » read more

Manufacturing Bits: Aug. 29


Compact synchrotron EUV sources For some time, the industry has been exploring the development of next-generation power sources for extreme ultraviolet (EUV) lithography. ASML and Gigaphoton are separately developing EUV sources based on the more traditional and compact laser-produced-plasma (LPP) technology. Then, in R&D, others are exploring the development of futuristic EUV sources us... » read more

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