Fractilia: Pattern Roughness Metrology


A new startup has emerged and unveiled a technology that addresses one of the bigger but less understood problems in advanced lithography--pattern roughness. The startup, called Fractilia, is a software-based metrology tool that analyzes the CD-SEM images of pattern roughness on a wafer. Fractilia, a self-funded startup, is led by Chris Mack and Ed Charrier. Mack, known as the gentleman sc... » read more

zeroK NanoTech: FIB Circuit Edit


Focused ion beam (FIB) circuit editing is an enabling technology that has been around for some time. Using a standard FIB tool, a chipmaker can basically edit portions of a circuit before it goes into production. It allows chipmakers to debug chips, cut traces, add metal connections and perform other functions. One startup, zeroK NanoTech, is putting a new and innovative twist on FIB circui... » read more

Maglen: Multi-Beam E-Beam Inspection


Wafer inspection, the science of finding defects on a wafer, is becoming more challenging and costly at each node. In fact, the ability to detect sub-30nm defects is challenging with today’s inspection tools, which are primarily based on two separate technologies—optical and e-beam. In the inspection flow, chipmakers first use e-beam inspection, mainly for engineering analysis. E-beam is... » read more

Avogy: Vertical GaN Power Devices


Gallium nitride (GaN), a binary III-V bandgap material, has been used to make LEDs for the last several years. GaN has also been touted as the next big thing in power electronics and RF. To some degree, GaN has made inroads in RF, especially in high-end defense and aerospace applications. But the technology is having mixed success in power electronics. Today’s GaN-on-silicon devices are l... » read more