Knowledge Center

Knowledge Center ➜ Entity
D2S
Supplies computation design platform to improve eBeam technology.
popularity

Description:

D2S was founded in 2007 to enable advanced mask designs at 20nm and below process nodes using complex shapes and existing eBeam mask writing equipment.

The company supplies a computational design platform combines coarse-grain and fine-grain parallelism to simulate a 1 quintillion pixel dose map. D2S also heads up the and heads the eBeam Initiative, an education and promotional organization focused on electron beam technologies. Members include a number of very large companies from all sides of the manufacturing, test, and EDA spectrum.



  • Founded by: Aki Fujimura in 2007
  • HQ: San Jose, California, USA
  • Known for: photomask lithography tools
  • Web: URL
  • Other names: Design 2 Silicon
  • Entity Type: Company

Suggestions?

We want to hear from you. If you have any comments or suggestions about this page, please send us your feedback.