Litho-freeze-litho-etch (LFLE) is a variation of the litho-etch-litho-etch (LELE) process. In LFLE, there are two lithography steps and only one etch step. In the first step, the pattern is exposed on the substrate using lithography. Then, the pattern is “frozen” or coated using a chemical treatment, namely a resist. Then, the pattern undergoes a lithography step to double the density, followed by an etch process.