A hot embossing process type of lithography.
Nanoimprint lithography (NIL) resembles a hot embossing process, which enables fine features on a structure. In NIL, the desired structure is patterned onto a master template or mold. The template is patterned using an e-beam or scanner. Then, with a NIL tool, the template with the desired patterns is pressed into a thin resist cast on a substrate. The template is removed, thereby duplicating the patterns on the substrate.