EUV Mask Readiness Challenges


Semiconductor Engineering sat down to discuss extreme ultraviolet (EUV) lithography and photomask technologies with Emily Gallagher, principal member of the technical staff at Imec; Harry Levinson, principal at HJL Lithography; Chris Spence, vice president of advanced technology development at ASML; Banqiu Wu, senior director of process development at Applied Materials; and Aki Fujimura, chief ... » read more

Timing Is Of The Essence


Today's advanced 16/7nm system-on-chips (SoCs) are faced with increased variation as they push for lower power. While the sizes of the transistors continue to shrink following Moore's Law, the threshold voltages fail to scale. This causes wide timing variability leading to timing closure difficulties, design re-spins and poor functional yield. Learn how ANSYS Path FX with its unique variatio... » read more

How To Build An Automotive Chip


The introduction of advanced electronics into automotive design is causing massive disruption in a supply chain that, until very recently, hummed along like a finely tuned sports car. The rapid push toward autonomous driving has changed everything. This year, Level 3 autonomy will begin hitting the streets, and behind the scenes, work is underway to design SoCs for Level 4. But how these chi... » read more

New Design Approaches At 7/5nm


The race to build chips with a multitude of different processing elements and memories is making it more difficult to design, verify and test these devices, particularly when AI and leading-edge manufacturing processes are involved. There are two fundamental problems. First, there are much tighter tolerances for all of the components in those designs due to proximity effects. Second, as a re... » read more

Comparative Stochastic Process Variation Bands For N7, N5, And N3 At EUV


By Alessandro Vaglio Preta, Trey Gravesa, David Blankenshipa, Kunlun Baib, Stewart Robertsona, Peter De Bisschopc, John J. Biaforea a) KLA-Tencor Corporation, Austin, TX 78759, U.S.A. b) KLA-Tencor Corporation, Milpitas, CA 95035, U.S.A. c) IMEC, Kapeldreef 75, 3000, BE ABSTRACT Stochastics effects are the ultimate limiter of optical lithography technology and are a major concern for n... » read more

Reliability Becomes The Top Concern In Automotive


Reliability is emerging as the top priority across the hottest growth markets for semiconductors, including automotive, industrial and cloud-based computing. But instead of replacing chips every two to four years, some of those devices are expected to survive for up to 20 years, even with higher usage in sometimes extreme environmental conditions. This shift in priorities has broad ramificat... » read more

Week In Review: Design, Low Power


Tools & IP OneSpin revealed its latest formal app, Connectivity XL, providing formal connectivity checking to 7nm, multi-billion gate SoC designs. The app generates detailed connectivity specification tables from abstract connectivity specs through a dedicated checking engine that integrates structural and formal analysis to perform on-the-fly, automated abstractions. It supports verificat... » read more

China’s Foundry Biz Takes Big Leap Forward


China continues to advance its foundry industry with huge investments in new fabs and technology, despite trade tensions and a slowdown in the IC market. China has the most fab projects in the world, with 30 new facilities or lines in construction or on the drawing board, according to data from SEMI’s World Fab Forecast Report. Of those, 13 fabs are targeted for the foundry market, accordi... » read more

Variation’s Long Tentacles


Today, most design engineers don't pay much attention to variation. It's generally considered to be a manufacturing problem. Even within the fab, various job functions are segmented enough that variation in one part of the process, such as the photomask shop, doesn't necessarily come to the attention of the people doing deposition and etch or those polishing the wafers. But increasingly, ... » read more

The Data Deluge


Lip-Bu Tan, president and CEO of Cadence, sat down with Semiconductor Engineering to discuss the intersection of big data and technology, from the data center to the edge and vertical markets such as automotive. What follows are excerpts of that conversation. SE: What are the biggest changes you've seen over the past year? Tan: We are moving quickly toward data-driven economics. There... » read more

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