Free-electron laser EUV consortium
Extreme ultraviolet (EUV) lithography is delayed. Chipmakers hope to insert EUV at the 7nm node, but that’s not a given. As before, the big problem is the EUV light source. So far, the source can’t generate enough power to enable the required throughput for EUV in high-volume production.
ASML’s current EUV source is operating at 80 Watts, up from 10 ... » read more