Manufacturing Bits: Sept. 1

Free-electron laser EUV consortium Extreme ultraviolet (EUV) lithography is delayed. Chipmakers hope to insert EUV at the 7nm node, but that’s not a given. As before, the big problem is the EUV light source. So far, the source can’t generate enough power to enable the required throughput for EUV in high-volume production. ASML’s current EUV source is operating at 80 Watts, up from 10 ... » read more

Emerging Security Protocols

As the proliferation of mobile devices ramps up at escalating rates, securing these devices and the infrastructure they run on is becoming a top priority for both the hardware and the data that swirls within it. Traditional security platforms such as firewalls and antivirus programs are still a viable part of the security envelope, but the rapid emergence of zero-day/hour threats is somethin... » read more