Resist Sensitivity, Source Power, And EUV Throughput

In a recent article, I quoted 15 mJ/cm2 as the target sensitivity for EUV photoresists, and discussed the throughput that could be achieved at various source power levels. However, as a commenter on that article pointed out, reaching the 15 mJ/cm² target while also meeting line roughness requirements is itself a challenging problem. Because of the high energy of EUV photons, a highly sensitive... » read more

Predictive Fab Management

Managing variation requires a different approach in fab management, moving from reactive to predictive methodologies. This is easier said than done, however. Predictive fab management requires a much more detailed understanding of everything happening in the fab, including process variation, equipment variation, mix variation—all of which must be managed with dispatch strategies to produc... » read more