tag: D2S

Big Changes Ahead For Photomask Technology
By Gregory Haley - 19 Oct, 2023 - Comments: 0

The move to curvilinear shapes on photomasks is gaining steam after years of promise as a way of improving yield, lowering defectivity, and reducing wasted space on a die — all of which are essential for both continued scaling and improved reliability in semiconductors. Interest in this approach ran high at this year's SPIE Photomask Technology + EUV Lithography Conference. Put simply, cur... » read more

Why Curvy Design Now? Less Change Than You Think And Manufacturable Today
By Jan Willis - 19 Oct, 2023 - Comments: 0

A curvilinear (curvy) chip, if magically made possible, would be smaller, faster, and use less power. Magic is no longer needed on the manufacturing side, as companies like Micron Technology are making photomasks with curvy shapes using state-of-the-art multi-beam mask writers today. Yet the entire chip-design infrastructure is based on the Manhattan assumption of 90-degree turns, even though i... » read more

Chip Industry Week In Review
By The SE Staff - 29 Sep, 2023 - Comments: 0

By Susan Rambo, Liz Allan, and Gregory Haley. TSMC rolled out the second version of its 3Dblox, which creates an infrastructure for stacking chiplets and other necessary components in a package, along with a standardized way of achieving that. Two novel features are chiplet mirroring for design reuse, and what is basically sandbox for power and thermal analysis of different design elements. ... » read more

Why Curvy Design Now? Manufacturing Is Possible And Scaling Needs It
By Jan Willis - 21 Sep, 2023 - Comments: 1

Have you ever seen roots or tree branches take a 90-degree turn? Have you ever seen a river that takes a 90-degree turn? Nature doesn’t do 90-degree turns, or for that matter any sharp angle turns – not even 135 degrees. Yet the entire chip-design infrastructure is based on the Manhattan assumption of 90-degree turns. While it would take time to change, is there any doubt that a curvilinea... » read more

High-NA Lithography Starting To Take Shape
By Gregory Haley - 25 Jul, 2023 - Comments: 3

The future of semiconductor technology is often viewed through the lenses of photolithography equipment, which continues to offer better resolution for future process nodes despite an almost perpetual barrage of highly challenging technological issues. For years, lithography was viewed as the primary manufacturing-related gating factor to continued device scaling, beset by multiple delays th... » read more

Multi-Beam Writers Are Driving EUV Mask Development
By Jan Hendrik Peters - 25 Jul, 2023 - Comments: 1

By Jan Hendrik Peters (bmbg consult) and Ines Stolberg (Vistec Electron Beam) The European Mask and Lithography Conference (EMLC) 2023, held in Dresden this past June, was attended by about 180 people and over 60 talks and posters were presented. With several keynote and invited talks over two and a half days, the conference gave an overview of the semiconductor and technology landscape in E... » read more

DAC/Semicon West Addresses Top Issues, Trends For Chips
By The SE Staff - 12 Jul, 2023 - Comments: 0

The Design Automation Conference (DAC) 2023 and Semicon West returned in full force this week, drawing in more attendees and sponsor companies than since before the pandemic. At times, booth traffic was four to five deep, blocking aisles, and standing room only was common at presentations. Hot topics included generative AI and the underlying semiconductor technology, data security, reliabili... » read more

Week In Review: Semiconductor Manufacturing, Test
By Gregory Haley - 16 Jun, 2023 - Comments: 0

Applied Materials sued its Chinese-owned rival, Mattson, over an alleged 14-month effort to steal valuable trade secrets, reports Bloomberg. In court filing, Applied Materials claimed that Mattson engaged in a spree of employee-poaching and covertly transferring semiconductor equipment designs. Global semiconductor materials revenue grew 8.9% to $72.7 billion in 2022, surpassing the previous... » read more

193i Lithography Takes Center Stage…Again
By Gregory Haley - 15 Jun, 2023 - Comments: 0

Cutting-edge lithography to create smaller features increasingly is being supplemented by improvements in lithography for mature process nodes, both of which are required as SoCs and complex chips are decomposed and integrated into advanced packages. Until the 7nm era, the primary goal of leading-edge chipmakers was to pack everything onto a single system-on-chip (SoC) using the same process... » read more

Reflections On Photomask Japan 2023: Embracing The Era Of Curvilinear Masks
By Seiji Nagahara - 18 May, 2023 - Comments: 0

In April, 2023, I had the privilege of participating in Photomask Japan 2023 (PMJ2023), a web conference that brought together experts and enthusiasts in the field. The conference commenced with an enlightening keynote talk by Dr. Kurt Ronse of imec on the status and challenges of the high NA EUV ecosystem, presenting roadmaps for the introduction of high NA EUV. I would like to express my grat... » read more

← Older posts Newer posts →

  • Sponsors

About

Navigation

Connect With Us

Copyright ©2013-2024 SMG   |  Terms of Service  |  Privacy Policy