Executive Insight: Elmar Platzgummer

Semiconductor Engineering sat down to discuss photomask and lithography trends with Elmar Platzgummer, chief executive of IMS Nanofabrication, an Austrian-based supplier of multi-beam e-beam tools for mask writing applications. SE: IMS has shipped the world’s first multi-beam e-beam system. Initially targeted for photomask writing, the tools are currently being tested in the field. How lon... » read more