A Novel Approach To Dummy Fill For Analog Designs Using Calibre SmartFill


With small geometry silicon processes, additional nonfunctional geometric structures are required to maintain layer planarity during the chemical/mechanical polishing (CMP) phase of processing. The automated layout flows to generate such geometries tend to be designed primarily for large system on chip (SOC) digital designs. When applied to mixed-signal layouts, these flows have been seen to ha... » read more

Balancing On The Color Density Tightrope


Balancing on wobbly tightropes is something that chip designers get pretty good at. For instance, there is a fine balance between optimizing performance and minimizing leakage in a design layout. Dealing with the new requirements that multi-patterning (MP) introduces into a design flow creates many new tightropes to walk. I tiptoed out on one of the rarely talked about ones in my last articleâ€... » read more

A Novel Approach To Dummy Fill For Analog Designs


With small geometry silicon processes, additional nonfunctional geometric structures are required to maintain layer planarity during the chemical/mechanical polishing (CMP) phase of processing. The automated layout flows to generate such geometries tend to be designed primarily for large system on chip (SOC) digital designs. When applied to mixed-signal layouts, these flows have been seen to ha... » read more

DFM Success At SMIC


Jeff Wilson As any integrated circuit (IC) designer knows, design rules are the “first line of defense” foundries provide in the effort to ensure all IC designs are ultimately manufacturable. Coming in a close second, design for manufacturing (DFM) rules enable designers to maximize design capabilities and performance while minimizing or optimizing the use of chip space. At today’s ad... » read more