What’s Next For Atomic Layer Etch?


After years in R&D, several fab tool vendors last year finally began to ship systems based a next-generation technology called atomic layer etch (ALE). [getkc id="284" kc_name="ALE"] is is moving into 16/14nm, but it will play a big role at 10/7nm and beyond. The industry also is working on the next wave of ALE technology for advanced logic and memory production. Used by chipmakers fo... » read more

Manufacturing Bits: Nov. 14


GaN for electric cars Leti is coordinating a new European project to improve the drivetrain in electric vehicles. The so-called ModulED project will focus on the development of gallium nitride (GaN) technology for electric vehicles. The goal is to use power-based GaN devices for the motor, enabling a change from direct current to alternating current. The three-year, €7.2 million proje... » read more

Power/Performance Bits: Dec. 20


Stamping with electronic ink Engineers at MIT fabricated a stamp made from carbon nanotubes that is able to print electronic inks onto rigid and flexible surfaces. The team's stamping process should be able to print transistors small enough to control individual pixels in high-resolution displays and touchscreens, said A. John Hart, associate professor of contemporary technology and mecha... » read more

Manufacturing Bits: Dec. 23


World’s smallest inkjet image ETH Zurich and Scrona have set the official world’s record for the smallest inkjet-printed color image. The feat, which has been recognized by the Guinness World Records, is based on Scrona’s so-called NanoDrip printing technology and quantum dots. ETH and Scrona printed an image of clown fishes and sea anemones. The printed image measures 0.0092mm² in a... » read more

Can Nano-Patterning Save Moore’s Law?


For years the academic community has explored a novel technology called selective deposition. Then, more than a year ago, Intel spearheaded an effort to bring the technology from the lab to the fab at 7nm or 5nm. Today, selective deposition is still in R&D, but it is gaining momentum in the industry. With R&D funding from Intel and others, selective deposition, sometimes called ALD-e... » read more

New Patterning Paradigm?


Chip scaling is becoming more difficult at each process node, but the industry continues to find new and innovative ways to solve the problems at every turn. And so chipmakers continue to march down the various process nodes. But the question is for how much longer? In fact, at 16nm/14nm and beyond, chipmakers are finding new and different challenges, which, in turn, could slow IC scaling or br... » read more