Manufacturing Bits: Dec. 2

Storage ring EUV source Needless to say, extreme ultraviolet (EUV) lithography is delayed. Chipmakers hope to insert EUV at the 7nm node, but that’s not a given. As before, the big problem is the EUV light source. So far, the source can’t generate enough power to enable the required throughput for EUV in mass production. Researchers at the SLAC National Accelerator Laboratory have one p... » read more

Manufacturing Bits: May 13

Telling a FIB The National Institute of Standards and Technology (NIST) has built the first low-energy focused ion beam (FIB) microscope that uses a lithium ion source. Still in the R&D stage, the FIB microscope from NIST could be used to examine adjacent materials that are chemically different and identify the elements that make them up. The FIB microscope uses an ion source based on p... » read more