Inside Lithography And Masks


Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at [getentity id="22217" e_name="Imec"]; Harry Levinson, senior fellow and senior director of technology research at [getentity id="22819" comment="GlobalFoundries"]; David Fried, chief technology officer at [getentity id="22210" e_name="Cove... » read more

Big Changes In Patterning


Aki Fujimura, CEO of [getentity id="22864" comment="D2S"], sat down with Semiconductor Engineering to discuss patterning issues at 10nm and below, including mask alignment, the need for GPU acceleration, EUV's future impact on the total number of masks, and what the re-introduction of curvilinear shapes will mean for design. SE: Patterning issues are getting a lot of attention at 10nm and 7n... » read more

Will GPU-Acceleration Mean The End Of Empirical Mask Models?


Shrinking mask feature sizes and increasing proximity effects are driving the adoption of simulation-based mask processing. Empirical models have been most widely used to date, because they are faster to simulate. Today, GPU-acceleration is enabling fast simulation using physical models. Does the ability of GPU-acceleration to make physical models a practical solution mean the end of empirical ... » read more

Tech Talk: GPU-Accelerated Photomasks


Noriaki Nakayamada, group manager for the data control engineering group in NuFlare's Mask Lithography engineering Department, talks about what's changing on the mask side, where the trouble spots are, and how to deal with them at advanced process nodes. [youtube vid=f8PixJMadXw] » read more