More EUV Mask Gaps


Extreme ultraviolet (EUV) lithography is at a critical juncture. After several delays and glitches, [gettech id="31045" comment="EUV"] is now targeted for 7nm and/or 5nm. But there are still a number of technologies that must come together before EUV is inserted into mass production. And if the pieces don’t fall into place, EUV could slip again. First, the EUV source must generate more ... » read more

Manufacturing Bits: Nov. 1


U.S. to boost IC competitiveness President Obama’s Council of Advisors on Science & Technology (PCAST) has launched a new semiconductor working group in the United States. The new working group will focus on ways to strengthen the competitiveness of the U.S. semiconductor industry. It will provide recommendations to PCAST regarding the challenges facing the U.S. semiconductor industry. Th... » read more

Silicon Photonics Comes Into Focus


Silicon photonics is attracting growing attention and investment as a companion technology to copper wiring inside of data centers, raising new questions about what comes next and when. Light has always been the ultimate standard for speed. It requires less energy to move large quantities of data, generates less heat than electricity, and it can work equally well over long or short distances... » read more

Joint R&D Has Its Ups And Downs


As corporate spending on research and development dwindles, enterprises are reaching out to colleges and universities to supplement their R&D. And they often are finding eager partners in those endeavors, as professors and their graduate students look for help, financial and technical, in addressing long-term research projects. “Pure research is just a luxury no one can afford anymore,... » read more

Faster Time To Yield


Michael Jamiolkowski, president and CEO of Coventor, sat down with Semiconductor Engineering to talk about ways improve yield ramp and optimize designs. What follows are excerpts of that conversation. SE: Why does it take so long to get a chip all the way through to manufacturing? Jamiolkowski: There are three parts to that. There is a research side. You want to be able to explore new th... » read more

How Small Will Transistors Go?


By Mark LaPedus & Ed Sperling There is nearly universal agreement that Moore’s Law is slowing down. But whether it will truly end, or just become too expensive and less relevant—and what will supplant device scaling—are the subject of some far-reaching research and much discussion. Semiconductor Engineering sat down with each of the leaders of three top research houses—[getent... » read more

What Transistors Will Look Like At 5nm


Chipmakers are currently ramping up 16nm/14nm finFET processes, with 10nm and 7nm just around the corner. The industry also is working on 5nm. TSMC hopes to deliver a 5nm process by 2020. GlobalFoundries, Intel and Samsung are doing R&D for that node. But 5nm technology presents a multitude of unknowns and challenges. For one thing, the exact timing and specs of 5nm remain cloudy. The... » read more

The Week In Review: Manufacturing


Market research Worldwide semiconductor capital spending is projected to decline 0.7% in 2016, to $64.3 billion, according to Gartner. This is up from the estimated 2% decline in Gartner's previous quarterly forecast. "Economic instability, inventory excess, weak demand for PC’s, tablets, and mobile products in the past three years has caused slow growth for the semiconductor industry. This ... » read more

Roots Of Distrust Spread


For most of the history of semiconductors there has been a persistent fear that someone would steal intellectual property from one company and sell it to another. There have been innumerable lawsuits involving corporate secrets that cross from one company to the next, and from one country to the next. The biggest concerns always were at the leading edges of technology, where those secrets w... » read more

The Week In Review: Design


Tools Synopsys unveiled its next-generation ATPG and diagnostics solution, TetraMAX II. According to the company, the tool is an order of magnitude faster than the previous generation, reducing runtime from days to hours, as well as generating 25% fewer patterns. The new tool is also certified for the ISO 26262 automotive functional safety standard. It has been deployed by STMicroelectronics... » read more

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