Device Pin-Specific Property Extraction For Layout Simulation


As we work through the sub-20 nm design space, the interactions between and effects on devices that are near each other are becoming critical factors in achieving the desired electrical performance. Accurate extraction of device pin-specific properties for modelling these effects is essential to attaining design goals. LVS extraction challenges Layout vs. schematic (LVS) comparison tools prov... » read more

LVS Boxing Helps Designers Knock Out Designs Quickly


Keeping up with the constant demand for better, faster design flow performance while preserving the original layout hierarchy of a design can be very challenging during design verification. Designers must constantly manage tradeoffs between performance, database size, and accuracy. In the early design cycle, using the LVS boxing capabilities of Calibre nmLVS to replace incomplete or missing blo... » read more

Optimization Challenges For 10nm And 7nm


Optimization used to be a simple timing against area tradeoff, but not anymore. As we go to each new node the tradeoffs become more complicated, involving additional aspects of the design that used to be dealt with in isolation. Semiconductor Engineering sat down to discuss these issues with Krishna Balachandran, director of product management for low-power products at [getentity id="22032"... » read more

LVS Boxing Helps Designers Knock Out Designs Quickly


Keeping up with the constant demand for better, faster design flow performance while preserving the original layout hierarchy of a design can be very challenging during design verification. Designers must constantly manage tradeoffs between performance, database size, and accuracy. In the early design cycle, using the LVS boxing capabilities of Calibre nmLVS to replace incomplete or missing blo... » read more

You’re Not Alone


All too often we get caught up in our own work and our own issues, thinking no one else could possibly be having as much trouble as we are. The reality is that many, if not most, of the problems and challenges in IC verification are not unique to one design, one team, or one person. The natural reluctance of people to admit they are struggling with some aspect of their job often keeps them from... » read more

Is There Light At The End Of Moore’s Tunnel?


Last month’s article, “Is There Light At The End Of Moore’s Tunnel,” examined the state of the industry in terms of integrating photonics components onto silicon. It concentrated on the piece that has been the hardest to achieve – the laser. However, as realizing that integration goal has become closer to reality, it has also waned in terms of the number of people who believe it is th... » read more

Fixing DP Errors: Colors Or Rings


By Ann Steffora Mutschler With the move to the 20nm manufacturing node, double patterning (DP) became a requirement. In addition, topology changes occurred that demanded very regular structures, marking a significant departure from 28nm design. As a result of this new approach, new errors are popping up, such as DP violation loops, odd cycle violations and anchor path violations. Certain... » read more

Verifying Your Intent


By Ann Steffora Mutschler Design rule checking (DRC), layout versus schematic (LVS) and electrical rule checking (ERC) are physical verification techniques that are mandatory today to check a design and its structures before manufacturing. Checking electrical characteristics of a design is one thing. Verifying power intent is quite another. And the overlap of the two is an intriguing con... » read more