Manufacturing Bits: June 16


Harmonic EUV The U.S. Department of Energy’s Lawrence Berkeley National Laboratory has devised an efficient extreme ultraviolet (EUV) source. The technology could one day be used for a new class of metrology tools, based on angle-resolved photoemission spectroscopy (ARPES). This technique makes use of a photoelectric effect for studying materials. To enable the source, Berkeley Labs devel... » read more

System Bits: Feb. 4


Speeding Access To Information Big data today is usually stored on multiple hard disks on a number of machines across an Ethernet network, but this storage architecture considerably increases the time it takes to access the information. Researchers at MIT have developed a storage system for big-data analytics they claim can dramatically reduce the time it takes to access information. The sy... » read more