KLA

The candidate will develop algorithms to classify defects in scanning electron beam microscope images of semiconductor wafers.  The sensitivity requirements in chipmaking place the performance metrics of these algorithms well beyond the best machine learning algorithms in the public domain. The candidate is expected to comfortably challenge existing techniques, and to engineer novel solutions and demonstrate their efficacy through data analysis. The candidate will work closely with hardware teams to build a solid understanding of the physics of image formation in electron microscopy, incorporate it into the research, and provide feedback to guide the development of future systems, and implement algorithms in an eventual product. Depending on the candidate’s background, the role will potentially expand into related areas of research such as optical scattering in complex media and optical defect detection.

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