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KLA

The RAPID division is the world leading provider of reticle inspection solutions for the semiconductor industry. The company provides inspection solutions to both the mask shops and the semiconductor fabs to ensure that lithography yields are consistently high thus enabling cost-effective manufacturing.

Responsibilities

Join a team focused on the development and integration of Extreme Ultraviolet sources for lithographic mask inspection tools.

You will experience a dynamic and explorative character of the EUV source project, which demands broad expertise and deep knowledge of vacuum and plasma technology, optics and lasers, cryogenic techniques, fast dynamic control and precision metrology.

You will assist scientists and engineers in designing and implementing EUV metrology systems along with data acquisition electronics and control software.

You will have a chance to broaden your expertise and gain experience with cutting-edge technology and pioneering research.

For more details, hit “apply for job”