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Lam Research

Responsible for the development of new plasma etching processes using innovative approaches for the company’s complex semiconductor capital equipment and systems. Capable of conceiving new ideas and independently run experiments to show feasibility as well as full characterization of these new processes.

May support hardware development activities of product groups including enabling new engineering design development and modification.

May technically lead moderately complex projects, has ability to define problems and objectives, develop approach, analyze results, communicate findings, and provide recommendations.

Have advanced skills in analytical instrumentation and thin film metrology to enable fast and accurate data gathering to enable state-of-art development programs. Knowledgeable in chemistry and plasma physics is desirable, contributing to in-depth understanding of plasma processes and surface interactions in a wide range of dry etch chemistries.

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