Lam Research

Group:  ATD

Position Summary:


Responsible for the development of new plasma etching, PECVD/ALD deposition and wet clean processes using innovative approaches for the company’s complex semiconductor capital equipment and systems. Capable of conceiving new ideas and independently run experiments to show feasibility as well as full characterization of these new processes. May support hardware development activities of product groups including enabling new engineering design development and modification.


Have advanced skills in analytical instrumentation and thin film metrology to enable fast and accurate data gathering to enable state-of-art development programs. Knowledgeable in chemistry and plasma physics is desirable, contributing to in-depth understanding of wet chemical mechanisms, plasma processes and surface interactions in a wide range of dry etch, deposition and wet processes.


Ability to technically lead highly complex projects and has clear ability to define problems and objectives, develop differentiated approach, test plan, analyze results, communicate findings, and provide recommendations. Skilled in presentation to communicate findings to both internal and external to customers. Capable of technically leading and motivating a small engineering team to achieve milestones and meet timeline. Interfaces well with any other groups to collaborates on programs.

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