Lam Research

Lam is leading a collaboration with imec and ASML to optimize patterning process and explore EUV patterning limits for existing and future high-NA EUV scanners.  We are seeking an EUV lithography material and process expert to join our R&D team based at imec in Leuven, Belgium.


The selected candidate will work with multidisciplinary Lam Research and imec teams (Photolithography, Metrology, Dry Etch, Wet Process) to study, characterize and optimize EUV dry photoresist material.

For more & updated details, hit “Apply for job”