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Tokyo Electron (US)

Summary:
Perform chamber scale plasma modeling to test and optimize plasma properties to assist new hardware design in etch chambers. Work on zero to 3D profile modeling to optimize current etch process conditions and propose new operation regimes or process conditions. Collaborate with headquarter customer support and R&D teams to pursue possible solutions for any critical issues that chip makers are currently facing and will be facing in the near future. Conduct basic etch process development work to validate modeling assumptions in a clean room environment.
Responsibilities:
• Contribute as a vital team member of the modeling team focusing on semiconductor related research and development projects
• Interact and collaborate with other scientists and engineers to identify potential issues and subsequent solutions
• Build chemical models to better understand and optimize vapor and plasma etch processes
• Responsibilities include early recognition of industry trends, identification of key etching problems for future nodes, proposing novel solutions, and developing/managing complex interdisciplinary projects
• Communicate project goals and statuses both internally and externally at customer sites, conferences and consortia workshops

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