EUV Challenges And Unknowns At 3nm and Below

Fig. 1: Cross-section of an EUV mask. Source: Luong, V., Philipsen, V., Hendrickx, E., Opsomer, K., Detavernier, C., Laubis, C., Scholze, F., Heyns, M., “Ni-Al alloys as alternative EUV mask absorber,” Appl. Sci. (8), 521 (2018). (Imec, KU Leuven, Ghent University, PTB)

EUV Challenges And Unknowns At 3nm and Below

Rising costs, complexity, and fuzzy delivery schedules are casting a cloud over next-gen lithography.

Semiconductor Engineering

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