Special Report
Chip Ecosystem Apprenticeships Help Close The Talent Gap
Registered apprenticeships, community colleges, and in-house training can help build a broad workforce pipeline for technician roles and more advanced positions.
Top Stories
UCIe Goes Back To The Drawing Board
The open chiplet interconnect protocol faces some formidable challenges, but progress continues.
Building CFETs With Monolithic And Sequential 3D
Area benefits are significant for future transistor shrinks, but manufacturing challenges remain.
Tackling Variability With AI-Based Process Control
How AI is being used in the fab today, and what’s coming in the future.
Blogs
Editor in Chief Ed Sperling digs into Intel’s foundry push and why it’s starting to win converts, in Intel, And Others, Inside.
Lam Research’s James Kim shows how a biased deposition or etch process can create structural defects in different radial directions, leading to performance variability, in Techniques To Identify And Correct Asymmetric Wafer Map Defects Caused By Design And Process Errors.
Synopsys’ Vivek Jain argues that the data generated in a fab needs to be analyzed and acted on quickly to ensure tight process control, high yield, and avoid process excursions, in Utilizing Artificial Intelligence For Efficient Semiconductor Manufacturing.
SEMI’s Mark da Silva, Nishita Rao, and Karim Somani call for the industry to collaborate in developing a common understanding of digital twin technology across various hierarchical levels, in Integrating Digital Twins In Semiconductor Operations.
Sponsor White Paper
Computational Lithography Solutions To Enable High NA EUV
The challenges of high NA systems and the role computational lithography plays in advanced EUV lithography.
Make The Impossible Possible: Use Variable-Shaped Beam Mask Writers And Curvilinear Full-Chip Inverse Lithography Technology For 193i Contacts/Vias With Mask-Wafer Co-Optimization
A review of the benefits and mask time and quality for a full-chip, curvilinear, stitchless ILT with MWCO for VSB mask writers on 193i process wafer prints.
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