Special Report
Still Waiting For III-V Chips
Will new materials ever replace CMOS? Probably, but timing is a mystery.
Top Stories
5 Disruptive Mask Technologies
Photomask costs are rising with complexity at advanced nodes as existing technologies run out of steam.
How To Extend Litho Scaling
Given the industry’s track record of technology development, it’s likely that lithographic techniques will be extended with new innovations.
3D NAND Market Heats Up
Chips from Samsung, Intel, Micron being sampled, with others on the way.
One-On-One: Dave Hemker
Lam Research’s CTO looks at inflections in transistors and memory, lithography issues, an increased focus on cost, and what will change at 7nm and 5nm.
Blogs
Editor In Chief Ed Sperling observes that foundries have some tough choices ahead and not enough information to make them, in Will 10nm Be The Last Big Node?
Executive Editor Mark LaPedus notes there are 17 rare earth elements, all worth a lot of money and mostly found in China, in Searching For Rare Earths Again.
Technical Editor Katherine Derbyshire finds there is nothing lean about 14nm designs, in Talking About Dark Silicon.
Mentor Graphics’ David Abercrombie unfurls some best practices for dealing with density in a multi-patterned world, in Balancing On The Color Density Tightrope.
Semico Research’s Tony Massimini discovers how a lunch hour can disrupt an entire fab’s workflow, in The Power Of Collaboration: Solutions For Improving Manufacturing.
Sponsor White Paper
Demonstrating The Benefits Of Source-Mask Optimization And Enabling Technologies Through Experiment And Simulations
Recent experimental evidence of the performance advantage gained by intensive optimization and enabling technologies like pixelated illumination.
