Top Stories
Litho Options Sparse After 10nm
With EUV’s viability still uncertain, multi-patterning may be the cheapest option at 7nm. Beyond that, 3D architectures could be a game changer.
Design Rules Explode At New Nodes
The number and complexity of rules has been increasing since 28nm. Whose problem is it to solve? Plus, training and capabilities vary greatly across teams within the same companies.
ATE Market Gets More Crowded
Intel, National Instruments join the fray as other companies develop their own.
The Key To DSA
Block co-polymers scale interactions up to bring feature sizes down.
Challenges Mount For EUV Masks
Increased cost, rising uncertainty, problems with defects and inspect are raising questions about what happens even if EUV does become viable.
Executive Insight: Aki Fujimura
D2S’ CEO offers insights into upcoming bottlenecks and why the entire semiconductor industry should be concerned.
Blogs
Editor in Chief Ed Sperling predicts that the next phase of development will require a bunch of new technologies, and a new way of thinking about how to use them in, EUV Still Matters…But Less.
Executive Editor Mark LaPedus contends it might be time to take another look at SOI, especially for the next round of planar and finFET devices in, Time To Look At SOI Again.
Mentor Graphics’ David Abercrombie observes that multi-patterning is here to stay because without it Moore’s Law Scaling would be over in, Is Multi-Patterning Good For You?
Contributing Writer Michael Watts finds the future of factory variation depends on managing data and schedule in, Big Data In The Fab.
Maglen’s Tony Luo looks at what comes after optical inspection in a video tutorial, Custom Print For Multi-Column Inspection.
Semico Research’s Jim Feldhan predicts a slow Q4 but a much better 2015 in, Another Inventory Glut?
SEMI’s Lara Chamness analyzes the semiconductor materials market and growth drivers for next year in, Semiconductor Materials Market To Surpass $46 Billion In 2015.
White Paper
The Impact Of 14nm Photomask Uncertainties On Computational Lithography Solutions
How to achieve accurate representation of imaging system output, and what to watch out for along the way.
