Top Stories
Single Vs. Multi-Patterning Advancements For EUV
EUV patterning has come a long way in the past five years, but old challenges resurface with high-NA EUV.
Precise Control Of Copper Plating And CMP
The more complex the CMP processes, the more data they have to work with, and the bigger the gains from adopting machine learning.
Ruthenium Interconnects On Tap
Chipmakers will stall as long as possible, but copper’s days are numbered.
Opportunities Grow For GPU Acceleration
The convergence of AI/ML and GPU advancements are creating new opportunities for faster processing.
Controlling Warpage In Advanced Packages
Mechanical stresses increase with larger sizes and heterogeneous materials.
Blogs
Amkor’s BeomSeok Kim, SeongHwan Kim, Unki Kim, SeongBeom Cho, DongHo Seo, and SangHun Yun show how to measure the impedance, capacitance, and inductance of active and passive elements, in Development Of Capacitance Measurement Unit For A System Level Tester.
Lam Research’s Taeyon (TY) Oh looks at parasitic defects and the effect of process variability on device performance at both the cell center and the cell edge, in Virtual Exploration Of Novel Vertical DRAM Architectures.
Synopsys’ Dwight Hunter explains how fabs can ramp new processes more quickly, in Applying Machine Learning To Accelerate TCAD Calibration.
Tignis’ Charlie Parker explores how AI/ML fits into the fab, from inventory management to institutional knowledge capture, but warns of potential pitfalls ahead, in AI: Great, But Somehow Still Not Very Good.
eBeam Initiative’s Toru Fujimori examines continued pattern shrinkage and the impact of stochastics in lithography, in Photoresist Materials Development.
SEMI’s Clark Tseng suggests looking beyond chip production when commercializing advanced technologies, in Driving Generative AI Innovation: 5 Competitive Advantages For Taiwan In Enabling The Next Industrial Revolution.
Sponsor White Papers
Custom Substrates Save Assembly Time, Resources
Custom substrates for prototype development and production, particularly for SSD’s, power and RF devices.
GPU Acceleration For Pixel-Based Computing In Various Mask Processing And Verification Steps
O(p) approach for GPU acceleration for accurate and practical data processing for curvy masks.
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