Top Stories
Searching For EUV Mask Defects
What comes after optical inspection isn’t clear, and that’s a problem.
MEMS Market Shifting
More precision, new materials and a much smaller universe of companies help to make this market attractive again.
Next-Gen Mask Writer Race Begins
New tools will be required at 7/5nm, and at this point it’s a two-company competition.
Blogs
Editor In Chief Ed Sperling argues that technology’s future will be defined by people shortages, trade imbalances and a very large market opportunity, in The Great Skills Race.
Executive Editor Mark LaPedus interviews UC Berkeley’s Tsu-Jae King Liu about implant lithography, reconfigurable wires and almost gate-all-around, in Exploring New Scaling Approaches.
Applied Materials’ Adam Ge and Shimon Levi examine new options for faster throughput, in Improving Optical Overlay And Measurement.
SEMI’s Paula Doe finds that new technologies and different ways of integrating more intelligence are generating new opportunities in the MEMS market, in What’s Up With MEMS?
Lam Research’s Aaron Eppler observes that the last frontier for improving yield is the outer 10mm, in Controlling Uniformity At The Edge.
Coventor’s Michael Hargrove investigates three different air gap process flows and the resulting capacitance reduction, in Reducing BEOL Parasitic Capacitance Using Air Gaps.