Special Report
Who’s Winning The FinFET Foundry Race?
Slugfest looms as foundry giants place their bets on when, and if, volume will ramp.
Top Stories
Ion Implanter Market Heats Up
Increasingly precise tools are needed for 3D structures; vendors rush to fill the gap.
Directed Self-Assembly: Hype Or Revolution?
There are no certainties anymore in lithography, but directed self-assembly does present some significant advantages that will carry through for at least several nodes.
More Problems Ahead
Patterning, feature shrinks and voltage scaling are all making it more difficult to keep pace with Moore’s Law.
What’s Next For Memory?
Questions abound over how to scale memory; LPDDR5 and Wide I/O-2 lead the charge.
Blogs
Editor in Chief Ed Sperling contends that what chipmakers decide in the next few years will determine the future and fate of large foundries, in Why The Next Couple Process Nodes Are So Critical.
Executive Editor Mark LaPedus says IBM’s semiconductor division is still in play, but it also could remain a viable part of the company — and a resouce for the entire semiconductor industry, in Plotting IBM Micro’s Future.
After months of research on quantum technology and qubits, technology editor Katherine Derbyshire finds plenty of material for anyone looking to dig deeper into this subject, in Reading About Quantum Computing.
Mentor Graphics’ David Abercrombie argues that we need to spend some time pondering whether multi-patterning is good for us, in Self-Aligned Double Patterning—Part Deux.
Semico Research’s Joanne Itow observes that Intel, TSMC and Samsung are involved in an interesting strategy game—one with no obvious winner because there are too many variables—in FinFET Ramp: Changing Market Dynamics?
SEMI’s 450 Central editor shows off the first 450mm wafers patterned with immersion lithography in This Is What 450mm Wafers Look Like.
Sponsor White Paper
Pattern Matching: Blueprints For Further Success
How to implement automated pattern capture and pattern matting in various IC flows at emerging process nodes.