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Onto Innovation

Metrology, defect inspection, lithography, and smart manufacturing software.
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Description

Onto Innovation provides a range of metrology, defect inspection, and lithography systems as well as smart manufacturing and yield management software for semiconductor manufacturing.

Onto was formed from the merger of Nanometrics Incorporated and Rudolph Technologies in 2019. Nanometrics, founded in 1975, provided optical metrology and inspection products. Rudolph Technologies, founded in 1940, made a range of equipment for measurement and inspection.

  • HQ: Wilmington, Mass., U.S.
  • Founded: 2019
  • Founded by: Merger of Nanometrics Incorporated and Rudolph Technologies
  • Website: https://ontoinnovation.com

Acquisitions

November 2025: Unique materials composition and electrical analysis product lines from Semilab International, valued at approximately $495 million.

October 2024: Lumina Instruments. Laser scattering technology.

October 2024: Lithography business from Kulicke and Soffa Industries.

January 2021: Inspectrology. Overlay metrology for controlling lithography and etch processes in the compound semiconductor market.

  • Type: Company

Multimedia

Moving Defect Detection And Classification To The Edge

Multimedia

Challenges In Stacking HBM

Multimedia

Overlay Optimization In Advanced IC Substrates

Multimedia

Yield Tracking In RDL

Multimedia

Total Overlay With Multiple RDLs