Technical Paper Home

Lithography

• Determinants Of Bond Wave Speed In Wafer Bonding (Yokohama, TEL)

  Published on June 5, 2025

• Demonstration Of EUV Scatterometry On A 2D Periodic Interconnect

  Published on May 18, 2025

• Differences In The Lithographic Impact Of Particles On The Pellicle Surface Depending On Type Of EUV Mask Pattern

  Published on April 25, 2025

• Scalable Approach For Fabricating Sub-10nm Nanogaps

  Published on April 7, 2025

• Demonstration Of An ALD IWO Channel In A GAA Nanosheet FET Structure (Georgia Tech, Micron)

  Published on February 14, 2025

• Indium Nitrate As An Advanced Metal-Oxide Resist for EUV Lithography

  Published on February 3, 2025

• Controlling Speckle Contrast Using Existing Lithographic Scanner Knobs to Understand LWR (Samsung, ASML)

  Published on January 29, 2025

• Recent Progress in Inorganic Metal-Oxide-Based Photoresists For EUVL

  Published on October 29, 2024

• High-NA EUV Lithography: Enhancing Resolution By Split Pupil Exposure (Fraunhofer, ASML)

  Published on October 8, 2024

• Block Copolymer and Sub-10nm Line Patterns By Directed Self-Assembly (Tokyo Tech)

  Published on September 11, 2024
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