A new technical paper titled “Process and materials compatibility considerations for introducing novel extreme ultraviolet resists in a fab: a guide for academia and entrepreneurs” was published by researchers at KU Leuven and imec.
Abstract Excerpt
“Despite having novel ideas, most researchers struggle to introduce their resist into an advanced fab, i.e., a facility where all the industrial-scale equipment for chip-making is present. The primary cause is the complicated and often nonharmonized protocols that are in place for contamination control and safety compliance. With this paper, we have tried to fill this gap as much as possible by lining out the details of the pre-requisites needed for novel material introduction in a fab.”
Find the technical paper here. December 2025.
Bilal A. Naqvi, Fabian Holzmeier, Ivan Madarevic, Danilo De Simone, and Stefan De Gendt “Process and materials compatibility considerations for introducing novel extreme ultraviolet resists in a fab: a guide for academia and entrepreneurs,” Journal of Micro/Nanopatterning, Materials, and Metrology 24(4), 040801 (1 December 2025). https://doi.org/10.1117/1.JMM.24.4.040801
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