Chip Industry Week In Review

AI panel-level packaging innovations at ECTC; cool HBM; 2nm EDA tools; side-channel attacks in 2.5/3D; Huawei claims; IC talent initiative; glass core substrates; memory test facility; Taiwan investments; SiC teamup; DRAM sizing; sequentially stacking silicon; MIPI A-PHY SerDes automotive compliance.

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ECTC

Panel-level packaging, hybrid bonding, new substrates, and fine-pitch interconnects topped the list of advanced packaging technologies at ECTC this week. Among the announcements:

  • ASE launched an automated 310mm × 310mm panel-level packaging production line. Expected to enter production in the first half of 2027, the line is compatible with FOCoS and FOCoS-Bridge packaging platforms, delivering line/space capabilities of 2/2µm and 8/8µm, respectively.

Fig.1: ASE’s automated panel-level packaging line supports 310mm × 310mm format

  • Imec and EV Group presented 200nm wafer-to-wafer hybrid bonding technology at a 200nm Cu interconnect pad pitch with high overlay accuracy.
  • LG Innotek introduced its 40% larger FC‑BGA substrate samples.
  • Fujifilm and imec uncorked their co-developed tin damascene bonding for fine-pitch microbumps and 1.0µm copper damascene interconnects. Fujifilm also introduced PFAS-free PBO insulating materials for semiconductor packaging.
  • Brewer Science showed its cleanable laser-release layer for temporary bonding/debonding and its low-temperature Cu/polymer hybrid bonding for 3D stacking.

More innovations

  • Cadence reported successful validation of an IP test chip on Intel Foundry‘s 18A process. Pre-validation of third-party IP is essential for ramping up production at a new process node.
  • Huawei proposed what it claims is a different approach to scaling, called Tau (time-scaling), prioritizing faster data movement over transistor density. It remains to be seen just how different Huawei’s approach will be, because most leading-edge designs have been heading in this direction for some time, looking at density scaling as just one facet of system technology co-optimization.
  • ASE‘s USI subsidiary unveiled a SiC chip-embedded power-packaging technology that places SiC dies inside multilayer ABF substrates.
  • SK hynix has developed a way to embed integrated cooling elements within the HBM die-to-die interface, creating an additional heat dissipation path that reduces thermal resistance by 30%.

Workforce

  • SEMI Foundation and the NSF launched the first four regional nodes of the NNME, a US microelectronics talent development infrastructure. Led by the Arizona Commerce Authority, Boise State, NY CREATES, and UT Austin, those regional nodes will include more than 325 organizations to expand IC training avenues, with potential funding of up to $20M per node over 5 years.

Reports and earnings

Quick links to more news:

 Global |In-Depth |Reports and Deals | New Technologies | Security | Vehicles, Batteries | Trending Video | Research | Events and Webinars


Global

Asia

  • Intel and 3D Glass Solutions will build an advanced packaging glass core substrate manufacturing facility in Odisha in eastern India.
  • Samsung plans to build a $1.5B mature-node memory chip test facility in Vietnam, per Reuters. The company also agreed that ~78K workers in its semiconductor division will receive average bonuses of ~$400k each via company shares, reports Nikkei.
  • Investments in Taiwan are growing. ASML is increasing its workforce by an additional 1,000 workers, and Nvidia says it will spend $150B/year in the country.
  • India‘s government launched a new portal for the country’s semiconductor investors.

Americas

  • Micron Technology started 1α DDR4/LPDDR4 DRAM manufacturing at its Manassas, Virginia, fab.
  • MIT plans to open a new shared-use Quantum Systems Lab.
  • SIA filed comments with the U.S. Department of Labor on foreign-worker wage rules, arguing that access to skilled workers is a strategic issue for U.S. semiconductor leadership and cited a projected shortfall of 34,000+ baccalaureate and advanced-degree semiconductor positions by 2030.

Europe

  • Eighteen European research and technology organizations, led by CEA-Leti, Fraunhofer FMD, and imec, will collaborate on RESOLVE, an effort to reduce dependence on non-European electronics companies.
  • A new ZVEI study projects that Europe’s semiconductor use will double by 2040, while chip demand from Europe’s manufacturing industry will grow 2.4X.

Reports and Deals

Deals and collaborations

  • Cadence, Siemens, and Synopsys announced EDA software certifications and expanded IP for Samsung Foundry‘s gen-2 2nm process.
  • Enteris and JSR inked a cross-licensing agreement on metal oxide resist patents. The companies also will explore joint opportunities for future photoresist materials.
  • FuriosaAI is teaming up with Broadcom to implement its AI accelerator architecture in a multi-die chiplet system.
  • Cadence and X-FAB are jointly working to simplify design migration across X-FAB nodes, from 1µm to 110nm.
  • Purdue University and GCCS are jointly targeting thermal, power, and 6G bottlenecks in order to speed the commercialization of SiC.
  • Credo completed its $750M acquisition of DustPhotonics.

Investments and more fundings

  • IBM plans to invest more than $10B in quantum computing over five years.
  • Cyient raised $30M to support power semiconductors, custom ASSP R&D, and in-house validation and testing.
  • Quanscient raised ~$11.6M for cloud-based, quantum-enabled multiphysics simulation technology and AI-native HW.
  • Chip-scale metrology startup Lightfinder won a $0.25M investment in the 2026 Lam Capital Venture Competition.

Reports

Opinions


New Technologies

Rambus introduced a complete DDR5 9600 client memory module chipset for high-performance CUDIMM, CQDIMM, and CSODIMM modules.

Intel announced a family of processors for handheld gaming systems and discussed the origins of the EMIB, Embedded Multi-die Interconnect Bridge.

Infineon released SECORA Connect X, a ready-to-integrate payment solution to help OEMs turn smart wearables — like smart rings, fitness trackers, and watches — into secure contactless payment devices.

Keysight added an executable whiteboard to its RF circuit simulation software that can capture simulations, optimizations, decision trees, and design parameters to generate structured data ready for AI workflows.

Siemens added geometric deep learning technology to its Simcenter engineering simulation and test solutions portfolio, enabling what-if exploration and the creation of efficient AI reduced-order models from CFD simulation data.

Adhesives company Lintec will produce carbon nanotube EUV pellicles at a new center within Japan’s National Institute of Advanced Industrial Science and Technology.


Research

Georgia Tech researchers found that “NAND flash memory made with ferroelectric materials can withstand radiation levels up to 30 times higher than more conventional NAND flash memory. “

UIUC researchers created a low-temperature technique for stacking single-crystal silicon transistor layers into monolithic 3D chips, enabling dense vertical integration while staying within back-end thermal limits.

Monash University-led researchers created an on-chip programmable valley optoelectronic nanocircuit, integrating chirality-selective meta-waveguide photodetectors with TMDs.

More chip industry research

  • Crosstalk In Contemporary Quantum Devices (U. of Melbourne, CSIRO)
  • MXenes: A Roadmap on Synthesis, Processing, Applications (Rutgers et al.)
  • NV memories based on patterned metal–semiconductor heterostructures (EPFL et al.)
  • Oxygen-Tunnel ITO VCTs w/Enhanced Current Density and Reliability for Monolithic 3D CIM Systems (UNIST, KAIST et al.)

Security

Security standards consortium GlobalPlatform launched Pavona, an open-source silicon distribution for secure-by-default chip designs that includes certification-ready IP, two TSMC 3nm taped-out RoT reference designs, and what it calls the first openly available PQC stack for embedded silicon. Founding members of the project include Max Planck, Oxford, Qualcomm, and others.

New tools and warnings

  • The NSA launched an implementation guide for zero trust adoption.
  • Google Cloud introduced AI Threat Defense, an autonomous cybersecurity platform that finds, prioritizes, and patches vulnerabilities faster.
  • Anthropic published a vulnerability disclosure dashboard for bugs found by an early Claude Mythos Preview model.
  • CISA‘s new alerts this week are here.
  • Nvidia high-level alerts for Merlin and Isaac Launchable are here.

Security papers and reports


Vehicles, Batteries

ADAS, autonomous

EVs

  • CLEPA says Europe’s EV transition is at risk, based on data showing that EU automotive-supplier investment stayed relatively flat from 2021 to 2026, while China’s supplier investment rose 57% to about $115B.
  • Voltera and Revel are combining their businesses to develop more than 1,000 fast-charging networks in dense urban markets.
  • At a reported starting price of ~US $640k, Ferrari’s long-awaited first fully electric vehicle emerged this week with backlash on its design and pricing. Tech specs: ~1,036 hp, a 122-kWh battery, ~329 miles range, a 193-mph top speed, and 0–62 mph in about 2.5 seconds.  Compare 0-60 mph time for other EVs: Lucid Sapphire 1.89 secs; Tesla Model S Plaid 1.99-2.1 secs; Porsche Taycan Turbo GT ~2.2 sec.

Vehicle academic papers


Critical Factors For Storing Data In DRAM: New concerns and challenges for memory in AI data centers.

Steven Woo, fellow and distinguished inventor at Rambus, talks about latency under load, fill frequency, power issues, reliability, and cost considerations, and how all of these factors come together in HBM4 stacks.


Events and Webinars

Upcoming webinars are here, including:

How Data Rates Doubled, and Where Validation Reaches Its Limit, June 4

Be the SI/PI Expert: Route Correctly the First Time, June 17

Find upcoming chip industry events here, including:

EVENTS Date Location
Electronic Components and Technology Conference (ECTC) May 26 – 29 Orlando, Florida
Hardwear.io Security Trainings and Conference USA May 26 – 30 Santa Clara, CA
COMPUTEX Taipei Jun 2 – 5 Taipei
Siemens EDA IC Forum Europe Jun 3 – 17 Copenhagen June 3; Munich June 9; Dresden June 16; Eindhoven June 17
SWTest Conference Jun 8 – 10 Carlsbad, CA
Hardware Pioneer Max Jun 10 – 11 London
ESD Alliance 2026 Executive Outlook: How Agentic AI Will Change Chip Design and Verification Jun 10 San Jose, CA
IEEE/JSAP Symposium on VLSI Technology and Circuits Jun 14 – 18 Honolulu + Virtual
Automotive Electronics Congress Jun 16 – 17 Ludwigsburg, Germany
3D & Systems Summit Jun 17 – 19 Dresden
Scaling DRAM Technology to Meet Future Demands: System Challenges and Opportunities Jun 27 Raleigh, North Carolina
International Symposium on Computer Architecture (ISCA) Jun 27 – Jul 1 Raleigh, North Carolina
ALD/ALE 2026: Atomic Layer Deposition and Atomic Layer Etching Jun 28 – Jul 1 Tampa, Florida
International Conference on Synthesis, Modeling, Analysis and Simulation Methods, and Applications to Circuit Design (SMACD) Jun 29 – Jul 2 Dresden, Germany
The Chips to Systems Conference (DAC) Jul 26 – 29 Long Beach, CA
Find all events here.



1 comments

Dr. Dev Gupta says:

re: the pedigree of Intel EMIB & HBM LC

the technology for embedding dies into organic substrates was ready long before the need for EMIB arose around 2013 to boost wide I/O HBM Memory to CPU interconnect density

Around 2002 the Substrates group at Intel Chandler, AZ ( ably supported by Intel KK i,e. Japan ) had started R&D to embed dies into Build Up type Organic substrates . The motivation was lowering the Parasitics of power delivery to the X sistors ( ultimately to improve Clock Rate ), NOT merely boost interconnect densities ( early EMIB, but now – T is getting WARM, creeping back to the original 2002 objectives ) a current concern.

HVM for the current major version of BU type Organic Substrates ( Cu lines by Semi Additive Plating, NOT by subtractive etching, unlike the original IBM Japan SLC process limited by yield loss to L/S > 35 um ) w/ L / S of 20 um started at Intel ( OLGA ) in 1998 @ 2 mn pcs / wk ( by 2002 IBM Japan too changed to the Intel SAP process ( but by the IBM Japan had become Kyocera ). The Intel SAP process for BU Organic Substrates ( OLGA ) still in HVM today 28 yrs later ( now 8 / 8 um on larger Panels ), itself was descended from the SAP process for Electroplated Flip Chip Wafer Bumping ( another improvement over IBM and its Evaporated C4 ) developed at Motorola around 1991

The strategy for using Si Bridge Chips to assemble MCMs was already used ( & Patented ) by1991 in neighboring Motorola ( Tempe, AZ ) in an INVERSE Flip Chip configuration ( to implement a Heat Extraction from MCMs of HOT Bipolar ASICs for Supercomputers ) , mechanically far simpler than IBM TCM, once the Digital Camera guided FC Assy. Robots pioneered at Motorola were ready also by 1991.

HBM could not have been possible w/o the u Pillar FC also invented and put into HVM at Motorola by 1996 using Robotic Assy. lines. Today EEs ( IMEC ) not conversant w/ Metallurgy ( key to Adv. Packaging ) or responsible for costs might salivate about the Partitioning prospects of HBCu but what about the Yields ? Where is GraphCore today for who TSMC had by 2022 partitioned the Power Dely. Passives and interconnected them to Logic by HBCu ?

Last year AI Module makers had to spend $ 36 bn for HB, almost as much as their in house GPU. CPU,…. and they are going to have to spend 30% higher this year due to LOW yields for HBM 4 that has just started to Ship !!

But a solution is just around the corner, HBM – n ( where n = 4,5, .. ) – LC ( Low Cost ), 30% higher Die utilization, 30% higher Stacking Yield, perhaps 50% cheaper than HBM 4 ( on a per GB the price differential for which is 5x over LP DDR 5X ) !

Innovations for Adv. Packaging today require just as much Theory & Mathematical Optimization as was the case in 1990 when it was pioneered at Motorola in AZ.

And this time around siphoning off of all the AZ developed technologies will NOT be quite so easy, even though the clueless US Govt. ( e.g. CHIPS in DC ) has attracted them to AZ.

sd/
Dr. Dev Gupta
Chair IEEE – IRDS PI

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