Author's Latest Posts


Google Details Five Generations Of TPU Training Supercomputers


Researchers from Google and University of California, Berkeley published a technical paper titled “Google’s Training Supercomputers from TPU v2 to Ironwood: Architectural Stability, Scale, Resilience, Power Efficiency, and Sustainability Across Five Generations.” The paper summarizes five generations of Google TPUs, from TPU v2 through Ironwood, and examines how the systems evolved int... » read more

Cross-Validated Timing Analysis for Automotive CAN Networks (NYCU et al.)


Researchers from National Yang Ming Chiao Tung University (NYCU) and Chung Yuan Christian University have published “A Cross-Validated DSPN and Worst-Case Response-Time Framework for Timing Analysis of Automotive CAN Networks”. Abstract “Controller Area Network (CAN) remains a key in-vehicle communication protocol for distributed automotive control systems, where predictab... » read more

Optimizing EUV Source Efficiency With Radiation-Hydrodynamic Simulations (U. Of Osaka et al.)


Researchers from The University of Osaka, National Institute for Fusion Science, National Institutes for Quantum Science and Technology, and Osaka Metropolitan University, et al. have published “Optimization of EUV output by experimentally validated radiation-hydrodynamic simulations across a broad laser parameter space”.   Abstract “Practical requirements such as improving ... » read more

Refining Vision-Language Models For Lithography Defect Detection


Researchers from Hanyang University, Korea University, and Korea Institute of Industrial Technology have published “Failure-Aware Refinement of Vision-Language Model for Lithography Defect Detection”. Abstract “Semiconductor lithography inspection requires reliable detection of small pattern defects such as bridge, burr, pinch, and contamination. In this study, we propose ... » read more

Boosting EUV Conversion Efficiency With 2-Micron Dual-Beam Laser Irradiation


Researchers from Utsunomiya University, RIKEN, The University of Tokyo, and Tohoku University, et al. have published “40% boost in extreme ultraviolet conversion efficiency via simultaneous dual-beam 2-µm laser irradiation”. Abstract “Scaling extreme ultraviolet (EUV) source power for next-generation lithography demands higher conversion efficiency (CE) at reduced per-pulse ene... » read more

Read-Centric DTCO for IGZO FeFETs 3D Heterogeneous AI memories (imec, KU Leuven)


Researchers from imec and KU Leuven have published “DTCO of NOR-Type IGZO FeFETs for 3D Heterogeneous AI Memories: A Read-Centric Perspective”. Abstract excerpt “This work evaluates the viability of NOR-type IGZO FeFETs for 3D heterogeneous AI memories from a read-centric design-technology co-optimization (DTCO) perspective, spanning on-chip back-end-of-line (BEOL) RAMs an... » read more

Accelerating Zero-Knowledge Proof Generation With Reconfigurable Hardware (KAIST)


Researchers from Korea Advanced Institute of Science and Technology (KAIST) have published “ZK-Flex: A Flexible and Scalable Framework for Accelerating Zero-Knowledge Proofs”. Abstract “Zero-knowledge proofs (ZKP) allows a prover to convince a verifier of computational correctness without revealing private data, ensuring both privacy and verifiability. However, proof generation i... » read more

Analyzing Rowhammer Vulnerability in Monolithic 3D IWO eDRAM for Edge (ASU, Georgia Tech)


Researchers from Arizona State University and Georgia Institute of Technology published “Thermal- and Aging-Aware Rowhammer Vulnerability Analysis of Monolithically-Integrated IWO eDRAM for Edge Platforms”. "This work presents the first comprehensive temperature- and aging-aware vulnerability analysis of amorphous Indium Tungsten Oxide (IWO) embedded DRAM (eDRAM), a promising next-... » read more

Scaling Nanoribbon Transistors with Monolayer TMDs (Stanford, Chalmers, Horiba, SLAC)


Researchers from Stanford University, Chalmers University of Technology, HORIBA Scientific, and SLAC National Accelerator Laboratory have published “Scaling nanoribbon transistors with monolayer transition metal dichalcogenides”. Abstract “Nanoscale transistors demand aggressive scaling of all channel dimensions—length, width and thickness. Two-dimensional semiconductors (2DS... » read more

Using Graph Attention for Virtual Metrology in Semiconductor Manufacturing (Intel Foundry, ASU)


Researchers from Arizona State University and Intel Foundry have published “Graph Attention-Based Virtual Metrology for Film Deposition Processes in Semiconductor Manufacturing”. Abstract “Artificial intelligence-driven semiconductor manufacturing increasingly operates at nanometer and angstrom scales, where precise process control depends on accurate and timely metrology. Howeve... » read more

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