Researchers at KTH Royal Institute of Technology published a technical paper titled “Lithographic patterning of conformal thin films on 3D structures using Scaffold-architected Lift-off masks.”
Abstract Excerpt: “Here we present a robust approach for patterning of conformal thin-film coatings on complex 3D structures.” “It is agnostic to the used thin-film deposition process and enables even lift-off patterning of atomic layer deposited (ALD) conformal coatings, a task infeasible for conventional shadowing-based lift-off processes.”
Find the technical paper here. July 2026.
Liu, X., Che, Z., Maj, Z. et al. Lithographic patterning of conformal thin films on 3D structures using Scaffold-architected Lift-off masks. Nat Commun 17, 6201 (2026). https://doi.org/10.1038/s41467-026-75538-z
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