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Invarium, Inc.

Lithography-modeling and pattern-synthesis technology


Invarium’s pattern synthesis capabilities enable superior pattern resolution and faster yield ramp for designs targeted to 45-nanometer-and-below process technologies. Invarium’s specific area of expertise is the development of pattern-synthesis technologies that enable superior photomask design and process optimization, encompassing the entire manufacturing-process flow from mask making to lithography and etch, with industry-leading speed.