tag: lithography

Scalable Approach For Fabricating Sub-10nm Nanogaps
By Technical Paper Link - 07 Apr, 2025 - Comments: 0

A new technical paper titled "A progressive wafer scale approach for Sub-10 nm nanogap structures" was published by researchers at Seoul National University, Chung-Ang University, Mohammed VI Polytechnic University and Ulsan National Institute of Science and Technology. "We have advanced the atomic layer lithography method into an efficient, scalable approach for fabricating sub-10 nm nanoga... » read more

Reflecting On The SPIE Advanced Lithography + Patterning Symposium 2025
By Harry Levinson - 20 Mar, 2025 - Comments: 0

The mood at this year’s SPIE Advanced Lithography + Patterning Symposium was decidedly upbeat. The outlook for business is good, due in large measure to expectations of high demand for chips, driven by artificial intelligence (AI). To realize the potential of AI, increases in chip performance and efficiency are needed, which, in turn, requires advanced patterning. In the Symposium’s technic... » read more

EUV’s Future Looks Even Brighter
By Gregory Haley - 20 Feb, 2025 - Comments: 1

The rapidly increasing demand for advanced-node chips to support everything-AI is putting pressure on the industry's ability to meet demand. The need for cutting-edge semiconductors is accelerating in applications ranging from hyperscale data centers powering large language models to edge AI in smartphones, IoT devices, and autonomous systems. But manufacturing those chips relies heavily on ... » read more

Controlling Speckle Contrast Using Existing Lithographic Scanner Knobs to Understand LWR (Samsung, ASML)
By Technical Paper Link - 29 Jan, 2025 - Comments: 0

A new technical paper titled "Controlling Speckle Contrast Using Existing Lithographic Scanner Knobs to Explore the Impact on Line Width Roughness" was published by researchers at Samsung, ASML and Sungkyunkwan University. Abstract "Local critical dimension uniformity (LCDU) or line width roughness (LWR) is increasingly important in argon fluoride (ArF) immersion lithography systems (scanne... » read more

More Than Meets The Eye: Trends In Lithography
By Travis Brist - 23 Jan, 2025 - Comments: 0

Lithography, once the exclusive domain of artists and printmakers, also lies at the heart of integrated circuit (IC) production. The process of shining light on a substrate through a photomask to control exposure has been around since the 1960s and has been the key part of improving IC fabrication process resolution. At the time, the light sources used were in the human-visible spectrum, which ... » read more

Upcoming Challenges And Changes In Semiconductor Materials
By Laura Peters And Ed Sperling - 23 Jan, 2025 - Comments: 0

Semiconductor Engineering sat down with Dan Brewer and Srikanth Kommu, co-CEOs at Brewer Science, to talk about current and future changes in materials used in semiconductor manufacturing and adjacent markets. What follows are excerpts of that conversation. SE: What was behind the decision to have co-CEOs instead of just one? Brewer: We see a lot of value to having multiple perspectives b... » read more

Research Bits: Jan. 7
By Jesse Allen - 07 Jan, 2025 - Comments: 0

Deep UV microLED for maskless lithography Researchers from the Hong Kong University of Science and Technology, Southern University of Science and Technology, and the Suzhou Institute of Nanotechnology developed an aluminum gallium nitride deep-ultraviolet microLED display array for maskless lithography.  They also built a maskless lithography prototype platform. "The team achieved key brea... » read more

Research Bits: Oct. 29
By Jesse Allen - 29 Oct, 2024 - Comments: 0

Micro-LED DUV maskless lithography Researchers from the University of Science and Technology of China, Anhui GaN Semiconductor, and Wuhan University developed a vertically integrated micro-LED array for deep ultraviolet (DUV) maskless photolithography. The team fabricated a DUV display integrated chip with 564 pixels-per-inch density that uses a three-dimensional vertically integrated devic... » read more

Tuning Design And Process For High-NA EUV Stitching
By Kevin Lucas - 24 Oct, 2024 - Comments: 0

By Kevin Lucas and James Ban Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, see figure 1. The lithography patterning at a stitching boundary between two mask exposures will be affected by additional process variation than are encountered in ... » read more

Luminary Panel Sees Multi-Beam Mask Writers And Curvilinear Masks Key To 193i And EUV
By Jan Willis - 24 Oct, 2024 - Comments: 0

Attendance was up and the mood was optimistic at this year’s SPIE Photomask and EUV conference held September 29 through October 3, 2024. The optimism was apparent as well for multi-beam mask writers and curvilinear masks during the eBeam Initiative’s 15th annual reception and meeting held on October 1. In the eBeam Initiative’s annual Luminaries survey, 93% of those surveyed said that pu... » read more

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