Early Zone Correction for Enhanced Overlay Precision in Next-Generation FOPLP Lithography


AI chiplet architectures are driving advanced IC substrates (AICS) toward larger panels, finer line/space, and much tighter overlay budgets. This study presents a lithography strategy that combines ultra-large exposure field and fine-resolution imaging with algorithmic early zone correction (EZC) to reduce alignment-solution errors, the largest item in the lithography overlay budget. In this st... » read more

Expert Panel Sees History Of Continuous Photomask Innovations As Key To The Future


The eBeam Initiative conducted its 14th annual eBeam Initiative Luminaries survey in July and reported the results on September 23, 2025 to more than 200 attendees at its annual meeting during the BACUS SPIE Photomask Technology conference. Industry luminaries representing 51 companies from across the semiconductor ecosystem—including photomasks, electronic design automation (EDA), chip desig... » read more

Charting The Frontiers Of Photomask Technology And Extreme Ultraviolet Lithography


The enormous computing demands of AI and high-performance computing (HPC) applications are putting intense pressure on every aspect of chip development. Challenges arise during architecture, design, and verification, persist through the manufacturing process, and extend to post-silicon lifecycle management as chips are deployed in the field. Lithography, the fabrication step of shining light... » read more

Research Bits: Sept. 16


Beyond-EUV resists Researchers from Johns Hopkins University, East China University of Science and Technology, École Polytechnique Fédérale de Lausanne (EPFL), Soochow University, Brookhaven National Laboratory, and Lawrence Berkeley National Laboratory propose a combination of new resist materials and a higher-powered EUV process that could enable smaller chip feature sizes. The "beyond... » read more

Nanofabrication Protocol That Allows Patterning Metallic Electrodes on 2D Materials Reliably (KAUST, National University of Singapore)


A new technical paper titled "High-yield photolithography protocol to pattern metallic electrodes on 2D materials without adhesive metallic layers" was published by researchers at KAUST and National University of Singapore. Abstract "When using two-dimensional (2D) materials to build electronic devices, adjacent metallic films need to be deposited to form electrodes. However, weak adhesion ... » read more

GPU Acceleration Of Rigorous Lithography Simulations


Producing modern semiconductor devices is an immensely challenging process. Successful execution entails advanced process nodes, novel device architectures, new materials, and many fabrication steps. One especially challenging area is lithography, in which light is sent through a photomask, passes through a projection system of lenses and mirrors, and strikes the substrate to create the device ... » read more

40th EMLC Honors Three Decades Of Vision From Dr. Uwe Behringer


The European Mask Lithography Conference (EMLC), an annual event that brings together researchers from around the world to present the latest findings on photomask and lithography technology, returned to Dresden from June 16 to June 18, 2025, and took place for the 40th time – marking a memorable anniversary combined with a premiere. For over 30 years, Dr. Uwe Behringer shaped the conference ... » read more

Are Larger Reticle Sizes On The Horizon?


Making high-NA EUV lithography work will take a manufacturing-worthy approach to stitching together circuits or a wholesale change to larger masks. Circuit stitching between the exposure fields is challenging the design, yield and manufacturability of the high-NA (0.55) EUV transition. The alternative is a radical change from 6x6-inch to 6x11-inch masks that would eliminate stitching, but it... » read more

Photomask Changes And Challenges At Mature And Advanced Nodes


Experts at the Table: Semiconductor Engineering sat down to discuss the current state and future direction of mask-making, with Harry Levinson, principal lithographer at HJL Lithography; Aki Fujimura, CEO of D2S; Ezequiel Russell, senior director of mask technology at Micron; and Christopher Progler, executive vice president and CTO at Photronics. What follows are excerpts of that conversation.... » read more

Determinants Of Bond Wave Speed In Wafer Bonding (Yokohama, TEL)


A recent technical paper titled "Factors determining bond wave speed in wafer bonding" was published by researcher at Yokohama National University, Tokyo Electron Kyushu Limited and ANVOS Analytics. Abstract "Wafer-level direct bonding has become a critical process for advanced 3D architectures in logic, memory, and CMOS image sensors. The minimization of the wafer distortion caused by wafe... » read more

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