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• Efficient Ohmic contacts and built-in atomic sublayer protection in MoSi2N4 and WSi2N4 monolayers

  Published on December 10, 2021

• Pushing the limits of EUV mask repair: addressing sub-10 nm defects with the next generation e-beam-based mask repair tool

  Published on December 7, 2021

• International Roadmap for Devices and Systems lithography roadmap

  Published on November 19, 2021

• Making BaZrS3 Chalcogenide Perovskite Thin Films by Molecular Beam Epitaxy

  Published on November 13, 2021

• A graph placement methodology for fast chip design

  Published on November 9, 2021

• High-Voltage, High-Current Electrical Switching Discharge Synthesis of ZnO Nanorods: A New Method toward Rapid and Highly Tunable Synthesis of Oxide Semiconductors in Open Air and Water for Optoelectronic Applications

  Published on November 9, 2021

• Sputtered transparent electrodes for optoelectronic devices: Induced damage and mitigation strategies

  Published on November 3, 2021

• Substitutional synthesis of sub-nanometer InGaN/GaN quantum wells with high indium content

  Published on November 3, 2021

• Data-driven Scheduling for High-mix and Low-volume Production in Semiconductor Assembly and Testing

  Published on November 3, 2021

• Roadmap on organic–inorganic hybrid perovskite semiconductors and devices

  Published on November 3, 2021
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