OPC Technology was founded in 1996 to address the growing need in semiconductor manufacturing companies to increase yield and extend the life of the current generation of optical lithography equipment for deep submicron process technologies. The company developed technology computer-aided design (TCAD) software tools based on proprietary correction algorithms and models that improved the pattern fidelity of the transfer process from IC layout design through mask manufacturing to actual structures on silicon.
Developed software for resolution enhancement in optical lithography. Icluded software for Optical Proximity Correction (OPC) and design of Phase Shift Masks (PSM).
