D2S was founded in 2007 to enable advanced mask designs at 20nm and below process nodes using complex shapes and existing eBeam mask writing equipment.
The company supplies a computational design platform combines coarse-grain and fine-grain parallelism to simulate a 1 quintillion pixel dose map. D2S also heads up the and heads the eBeam Initiative, an education and promotional organization focused on electron beam technologies. Members include a number of very large companies from all sides of the manufacturing, test, and EDA spectrum.
