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Supplies computation design platform to improve eBeam technology.


D2S was founded in 2007 to enable advanced mask designs at 20nm and below process nodes using complex shapes and existing eBeam mask writing equipment.
The company supplies a computational design platform combines coarse-grain and fine-grain parallelism to simulate a 1 quintillion pixel dose map. D2S also heads up the and heads the eBeam Initiative, an education and promotional organization focused on electron beam technologies. Members include a number of very large companies from all sides of the manufacturing, test, and EDA spectrum.

  • Founded by: Aki Fujimura in 2007
  • HQ: San Jose, California, USA
  • Known for: photomask lithography tools
  • Web: URL
  • Other names: Design 2 Silicon
  • Type: Company