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D2S

Supplies computation design platform to improve eBeam technology.
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Description

D2S was founded in 2007 to enable advanced mask designs at 20nm and below process nodes using complex shapes and existing eBeam mask writing equipment.
The company supplies a computational design platform combines coarse-grain and fine-grain parallelism to simulate a 1 quintillion pixel dose map. D2S also heads up the and heads the eBeam Initiative, an education and promotional organization focused on electron beam technologies. Members include a number of very large companies from all sides of the manufacturing, test, and EDA spectrum.

  • Founded by: Aki Fujimura in 2007
  • HQ: San Jose, California, USA
  • Known for: photomask lithography tools
  • Web: URL
  • Other names: Design 2 Silicon
  • Type: Company