Author's Latest Posts


Overview Of The Current State of the Development Of Curvilinear Masks


A technical paper titled "Curvilinear masks overview: manufacturable mask shapes are more reliably manufacturable" was published by researchers at D2S. The paper covers: The rationale for curvilinear masks The application of the curvilinear inverse lithography technology The state of readiness of the curvilinear mask-making infrastructure, including mask rule checking, metrology, ... » read more

CD Spec For Curvilinear Masks


Within the photomask industry, there's a major transformation from conventional Manhattan masks to more advanced curvilinear masks. Researchers from D2S and Micron Technology propose an equivalent CD spec for the curvy masks and use this spec to show that curvy masks have smaller mask variations than Manhattan masks. Find the technical paper here. Published June 2024. Linyong (Leo) Pang, ... » read more

GPU Acceleration for Pixel-based Computing in Various Mask Processing and Verification Steps


A technical paper titled "Leaping into the curvy world with GPU accelerated O(p) computing" was published by researchers at D2S, Inc. The papers discusses the advantages of using GPU acceleration for pixel-based computing during various mask processing and verification steps.  It found that the O(p) approach for GPU acceleration is effective in handling data processing for curvy masks. F... » read more

GPU Accelerated Computing


The computing applications used in semiconductor design and manufacturing have ever-increasing requirements for speed, accuracy and reliability. The continuation of Moore's Law creates a perpetual demand for greater accuracy as, with each new process node, larger numbers of increasingly smaller features are crowded onto each mask and wafer. Computing farms, where thousands of central processing... » read more