June 2012 - Page 6 of 6 - Semiconductor Engineering

Aloha Lithography!

By Chris Mack - 10 Jun, 2012 - Comments: 0

An excuse to travel to Hawaii? You don’t have to ask me twice. Especially if it is the Big Island, my favorite of the Hawaiian isles. My excuse this time? The 3-beams conference, also called triple-beams, EIPBN, or occasionally (rarely) the International Conference on Electron, Ion and Photon Beam Technology & Nanofabrication. The conference was held last week (May 29 – June ... » read more

Time To Talk

By Ed Sperling - 08 Jun, 2012 - Comments: 0

A topic that surfaced repeatedly at DAC in multiple meetings, on panels, and over morning (and afternoon) coffee was the rapid increase in the size of software engineering teams. There are more software engineers than hardware engineers inside many chip companies these days, and they’re still not addressing an essential problem. While software teams do an incredible job of ironing out func... » read more

You Nits – a different way to think about nano-lithography

By Michael Watts - 04 Jun, 2012 - Comments: 0

Once in a while, it is fun to go and listen to what the IC guys are up too…its jaw dropping stuff. The trouble with reeling off the capability in industry standard units is that it is impossible to put in any perspective. Units are important, or as my physics teacher used to say when we made a mistake “You nits”. Translation…in England a nitwit is a stupid person ! The 22 nm node ... » read more

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