Aki Fujimura

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Aki Fujimura is the chairman and CEO of D2S Inc., which is the managing company sponsor of the eBeam Initiative. Previously, he served as CTO at Cadence Design Systems. Fujimura returned to Cadence for the second time through the acquisition of Simplex Solutions, where he was president/COO and inside board member. He was also an inside board member and vice president at Pure Software. Simplex and Pure both IPO’d during his tenure. He was a founding member of Tangent Systems in 1984, which was subsequently acquired by Cadence Design Systems in 1989. Fujimura is serving as president of the SPIE BACUS Technical Group and was recognized as a SPIE Fellow in 2023. He also serves on the governing council of the Electronic System Design Alliance, a SEMI technical community, and was on the board of HLDS, RTime, Bristol S7, and Coverity, all of which were successfully acquired. He received his BS/MS in Electrical Engineering from MIT.

Author's Latest Posts

Improving Uniformity And Linearity For All Masks
By Aki Fujimura - 29 Jan, 2025 - Comments: 0

When it comes to mask quality, there are two vital measurements: uniformity and linearity. Uniformity measures the consistency of the size of mask features in all occurrences across the entire mask, because different instances of the same target size can vary in size due to manufacturing variation. Linearity measures how well different sizes of shapes on the manufactured mask match their target... » read more

GPU-Based Computing In Photomask Manufacturing
By Aki Fujimura - 28 Mar, 2016 - Comments: 0

Graphical-processing unit (GPU)-accelerated computing has reached maturity for professional, scientific computing applications. One example of this is the recent GPU-accelerated thermal application for semiconductor photomask manufacturing, which is used in 24/7 manufacturing environments. GPU-accelerated computing won’t be a universal panacea for the semiconductor industry’s “need for sp... » read more

We Have Reached The Tipping Point For Simulation-Based Mask Data Preparation
By Aki Fujimura - 13 Nov, 2014 - Comments: 0

Since the beginning of the semiconductor industry, mask-data preparation (MDP) and mask verification (MV) have been shape-based: each shape has been treated as an entity unto itself, and if each isolated shape was correct, the mask was correct. This context independence is a critical assumption for conventional fracturing. However, as line/space measurements (L:S) fall below 50nm, shape-ba... » read more

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