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MIS Packaging Takes Off


Momentum is building for IC packages based on an emerging technology called molded interconnect substrate (MIS). ASE, Carsem, JCET/STATS ChipPAC, Unisem and others are developing IC packages based on MIS substrate technology, which is ramping up in the analog, power IC and even the cryptocurrency markets. MIS starts with a specialized substrate material for select IC packages. The MIS sub... » read more

The Week In Review: Manufacturing


Chipmakers Consumers recently filed a class-action suit against the three DRAM makers, alleging that they illegally agreed to raise prices for their respective memory products. The suit, filed in the U.S. District Court for the Northern District of California, alleges that Samsung, Micron and Hynix agreed to limit the supply of DRAM, driving up prices for this widely used memory. The pr... » read more

Manufacturing Bits: May 1


Adaptive materials The U.S. Army Research Laboratory (ARL) and the University of Maryland have developed a technique to make adaptive materials. Using ultraviolet light, researchers have devised a way that causes a composite material to become stiffer and stronger on-demand. This in turn could enable a variety of new capabilities for the U.S. military, such as rotorcraft design. In this... » read more

The Week In Review: Manufacturing


Chipmakers As reported, Intel is struggling at 10nm. Intel already has encountered some difficulties, as the chip giant late last year pushed out the volume ramp of its new 10nm process from the second half of 2017 to the first part of 2018, according to analysts. Intel continues to struggle with 10nm, and has delayed the volume ramp again, according to multiple reports. During its earnings... » read more

Next EUV Issue: Mask 3D Effects


As extreme ultraviolet (EUV) lithography moves closer to production, the industry is paying more attention to a problematic phenomenon called mask 3D effects. Mask 3D effects involve the photomask for EUV. In simple terms, a chipmaker designs an IC, which is translated from a file format into a photomask. The mask is a master template for a given IC design. It is placed in a lithography scan... » read more

Manufacturing Bits: April 24


Super electron guns The Department of Energy’s SLAC National Accelerator Laboratory is developing a new type of electron gun based on superconducting technology. The new superconducting electron gun recently produced its first beam of electrons, according to SLAC. The technology is being developed for future high-energy X-ray lasers and ultra-fast electron microscopes. Electron guns a... » read more

The Week In Review: Manufacturing


Trade The trade tensions are building between the U.S. and China. In the latest move, the U.S. Department of Commerce has imposed a ban on U.S. companies selling chips to ZTE, a Chinese telecom equipment and mobile phone vendor. The ban has been implemented on ZTE for seven years after the firm “was caught illegally shipping U.S. goods to Iran,” according to a report from Reuters. This... » read more

Too Many, Too Few Rare Earths


A team from Japan recently made a major discovery—they found massive deposits of rare earths on the ocean floor off the coast of Japan. The team of Waseda University, the University of Tokyo and the Japan Agency for Marine-Earth Science and Technology (JAMSTEC) found a deposit that equates to 16 million tons of rare earths. Rare earths are a group of critical materials used in various ele... » read more

New Patterning Options Emerging


Several fab tool vendors are rolling out the next wave of self-aligned patterning technologies amid the shift toward new devices at 10/7nm and beyond. Applied Materials, Lam Research and TEL are developing self-aligned technologies based on a variety of new approaches. The latest approach involves self-aligned patterning techniques with multi-color material schemes, which are designed for us... » read more

Searching For EUV Defects


Chipmakers hope to insert extreme ultraviolet (EUV) lithography at 7nm and/or 5nm, but several challenges need to be solved before this oft-delayed technology can be used in production. One lingering issue that is becoming more worrisome is how to find defects caused by [gettech id="31045" comment="EUV"] processes. These processes can cause random variations, also known as stochastic effects... » read more

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