Michael White

(all posts)
Michael White is the senior director of physical verification product management for Calibre Design Solutions at Siemens EDA, a part of Siemens Digital Industries Software. Prior to Siemens, he held various product marketing, strategic marketing, and program management roles for Applied Materials, Etec Systems, and the Lockheed Skunk Works. White received a B.S. in System Engineering from Harvey Mudd College, and an M.S. in Engineering Management from the University of Southern California.

Author's Latest Posts

Why Shift Left?

By Michael White - 24 Aug, 2023 - Comments: 0

As every integrated circuit (IC) design company knows, the faster a design can progress from implementation to signoff verification, the better the chances are of meeting tapeout schedules. Meeting tapeout schedules improves a company’s chances of reaching their market targets. But as companies create larger and more complex ICs and move to advanced process nodes, the challenge of achieving t... » read more

Considering The Power Of The Cloud For EDA

By Michael White - 27 Oct, 2022 - Comments: 0

By Michael White, Siemens EDA, in technical collaboration with Peeyush Tugnawat, Google Cloud, and Philip Steinke, AMD At DAC 2022, Google Cloud, AMD, and Calibre Design Solutions presented an EDA in the cloud solution that enables companies to access virtually unlimited compute resources when and as needed to optimize their design and verification flows. If your company is considering addin... » read more

EDA In The Cloud

By Michael White - 26 Mar, 2020 - Comments: 0

Interest in the use of third-party public clouds in conjunction with electronic design automation (EDA) applications has never been higher. Back in February, Ed Sperling and I did a video interview (embedded below) to discuss EDA and cloud computing. This article follows up on that interview, providing some additional insight into why and how the integrated circuit (IC) industry reached this po... » read more

Pattern Matching in Design and Verification

By Michael White - 19 May, 2016 - Comments: 0

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography. These rule checks proved far more complex to write, hard to code for fast runtimes, and difficult to debug. Incorporating an automated visual capture and compare process enabled designers to define t... » read more